{"id":1781,"date":"2020-09-26T23:16:24","date_gmt":"2020-09-26T14:16:24","guid":{"rendered":"https:\/\/www.ostech.co.jp\/wp\/business\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/"},"modified":"2020-09-26T23:16:24","modified_gmt":"2020-09-26T14:16:24","slug":"ain-ceramics-for-semiconductor-equipment","status":"publish","type":"page","link":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/","title":{"rendered":"AIN Ceramics for Semiconductor Equipment"},"content":{"rendered":"<p>The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties include excellent thermal conductivity, heat radiation and resistivity thermal shock tolerance and good insulating characteristics making this material an ideal match for cutting edge semiconductor capital equipment.<\/p>\n<p>&nbsp;<\/p>\n","protected":false},"excerpt":{"rendered":"<p>The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties include excellent thermal conductivity, heat radiation and resistivity thermal shock tolerance and good insulating characteristics making this material an ideal match for cutting edge semiconductor capital equipment. &nbsp;<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":1778,"menu_order":132,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-1781","page","type-page","status-publish","hentry"],"acf":[],"aioseo_notices":[],"aioseo_head":"\n\t\t<!-- All in One SEO 4.9.10 - aioseo.com -->\n\t<meta name=\"description\" content=\"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties\" \/>\n\t<meta name=\"robots\" content=\"max-image-preview:large\" \/>\n\t<link rel=\"canonical\" href=\"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/\" \/>\n\t<meta name=\"generator\" content=\"All in One SEO (AIOSEO) 4.9.10\" \/>\n\t\t<meta property=\"og:locale\" content=\"en_US\" \/>\n\t\t<meta property=\"og:site_name\" content=\"OSTECH Co., Ltd. | OSTECH\" \/>\n\t\t<meta property=\"og:type\" content=\"article\" \/>\n\t\t<meta property=\"og:title\" content=\"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.\" \/>\n\t\t<meta property=\"og:description\" content=\"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties\" \/>\n\t\t<meta property=\"og:url\" content=\"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/\" \/>\n\t\t<meta property=\"article:published_time\" content=\"2020-09-26T14:16:24+00:00\" \/>\n\t\t<meta property=\"article:modified_time\" content=\"2020-09-26T14:16:24+00:00\" \/>\n\t\t<meta name=\"twitter:card\" content=\"summary\" \/>\n\t\t<meta name=\"twitter:title\" content=\"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.\" \/>\n\t\t<meta name=\"twitter:description\" content=\"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties\" \/>\n\t\t<script type=\"application\/ld+json\" class=\"aioseo-schema\">\n\t\t\t{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/#breadcrumblist\",\"itemListElement\":[{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#listItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/\",\"nextItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/#listItem\",\"name\":\"Services\"}},{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/#listItem\",\"position\":2,\"name\":\"Services\",\"item\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/\",\"nextItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/#listItem\",\"name\":\"Fine Ceramics\"},\"previousItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#listItem\",\"name\":\"Home\"}},{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/#listItem\",\"position\":3,\"name\":\"Fine Ceramics\",\"item\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/\",\"nextItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/#listItem\",\"name\":\"AIN Ceramics for Semiconductor Equipment\"},\"previousItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/#listItem\",\"name\":\"Services\"}},{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/#listItem\",\"position\":4,\"name\":\"AIN Ceramics for Semiconductor Equipment\",\"previousItem\":{\"@type\":\"ListItem\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/#listItem\",\"name\":\"Fine Ceramics\"}}]},{\"@type\":\"Organization\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#organization\",\"name\":\"\\u3010\\u516c\\u5f0f\\u3011\\u682a\\u5f0f\\u4f1a\\u793e\\u30aa\\u30fc\\u30a8\\u30b9\\u30c6\\u30c3\\u30af\",\"description\":\"OSTECH\",\"url\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/#webpage\",\"url\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/\",\"name\":\"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.\",\"description\":\"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties\",\"inLanguage\":\"en-US\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#website\"},\"breadcrumb\":{\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/products\\\/fine-ceramics\\\/ain-ceramics-for-semiconductor-equipment\\\/#breadcrumblist\"},\"datePublished\":\"2020-09-26T23:16:24+09:00\",\"dateModified\":\"2020-09-26T23:16:24+09:00\"},{\"@type\":\"WebSite\",\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#website\",\"url\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/\",\"name\":\"\\u3010\\u516c\\u5f0f\\u3011\\u682a\\u5f0f\\u4f1a\\u793e\\u30aa\\u30fc\\u30a8\\u30b9\\u30c6\\u30c3\\u30af\",\"description\":\"OSTECH\",\"inLanguage\":\"en-US\",\"publisher\":{\"@id\":\"https:\\\/\\\/www.ostech.co.jp\\\/en\\\/#organization\"}}]}\n\t\t<\/script>\n\t\t<!-- All in One SEO -->\n\n","aioseo_head_json":{"title":"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.","description":"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties","canonical_url":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/","robots":"max-image-preview:large","keywords":"","webmasterTools":{"miscellaneous":""},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"BreadcrumbList","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/#breadcrumblist","itemListElement":[{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/#listItem","position":1,"name":"Home","item":"https:\/\/www.ostech.co.jp\/en\/","nextItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/#listItem","name":"Services"}},{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/#listItem","position":2,"name":"Services","item":"https:\/\/www.ostech.co.jp\/en\/products\/","nextItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/#listItem","name":"Fine Ceramics"},"previousItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/#listItem","name":"Home"}},{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/#listItem","position":3,"name":"Fine Ceramics","item":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/","nextItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/#listItem","name":"AIN Ceramics for Semiconductor Equipment"},"previousItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/#listItem","name":"Services"}},{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/#listItem","position":4,"name":"AIN Ceramics for Semiconductor Equipment","previousItem":{"@type":"ListItem","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/#listItem","name":"Fine Ceramics"}}]},{"@type":"Organization","@id":"https:\/\/www.ostech.co.jp\/en\/#organization","name":"\u3010\u516c\u5f0f\u3011\u682a\u5f0f\u4f1a\u793e\u30aa\u30fc\u30a8\u30b9\u30c6\u30c3\u30af","description":"OSTECH","url":"https:\/\/www.ostech.co.jp\/en\/"},{"@type":"WebPage","@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/#webpage","url":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/","name":"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.","description":"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties","inLanguage":"en-US","isPartOf":{"@id":"https:\/\/www.ostech.co.jp\/en\/#website"},"breadcrumb":{"@id":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/#breadcrumblist"},"datePublished":"2020-09-26T23:16:24+09:00","dateModified":"2020-09-26T23:16:24+09:00"},{"@type":"WebSite","@id":"https:\/\/www.ostech.co.jp\/en\/#website","url":"https:\/\/www.ostech.co.jp\/en\/","name":"\u3010\u516c\u5f0f\u3011\u682a\u5f0f\u4f1a\u793e\u30aa\u30fc\u30a8\u30b9\u30c6\u30c3\u30af","description":"OSTECH","inLanguage":"en-US","publisher":{"@id":"https:\/\/www.ostech.co.jp\/en\/#organization"}}]},"og:locale":"en_US","og:site_name":"OSTECH Co., Ltd. | OSTECH","og:type":"article","og:title":"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.","og:description":"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties","og:url":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/","article:published_time":"2020-09-26T14:16:24+00:00","article:modified_time":"2020-09-26T14:16:24+00:00","twitter:card":"summary","twitter:title":"AIN Ceramics for Semiconductor Equipment | OSTECH Co., Ltd.","twitter:description":"The ramping of chip manufacture on 300mm wafers and the move to ever small device design rules (130 nm and below) means the requirements on semiconductor manufacturing equipment are more stringent than ever. This means that each system component needs to be chosen carefully. AlN has excellently balanced properties for semiconductors equipment applications. These properties"},"aioseo_meta_data":{"post_id":"1781","title":null,"description":null,"keywords":null,"keyphrases":null,"primary_term":null,"canonical_url":null,"og_title":null,"og_description":null,"og_object_type":"default","og_image_type":"default","og_image_url":null,"og_image_width":null,"og_image_height":null,"og_image_custom_url":null,"og_image_custom_fields":null,"og_video":null,"og_custom_url":null,"og_article_section":null,"og_article_tags":null,"twitter_use_og":false,"twitter_card":"default","twitter_image_type":"default","twitter_image_url":null,"twitter_image_custom_url":null,"twitter_image_custom_fields":null,"twitter_title":null,"twitter_description":null,"schema":{"blockGraphs":[],"customGraphs":[],"default":{"data":{"Article":[],"Course":[],"Dataset":[],"FAQPage":[],"Movie":[],"Person":[],"Product":[],"ProductReview":[],"Car":[],"Recipe":[],"Service":[],"SoftwareApplication":[],"WebPage":[]},"graphName":"","isEnabled":true},"graphs":[],"defaultGraph":"","defaultPostTypeGraph":""},"schema_type":null,"schema_type_options":null,"pillar_content":false,"robots_default":true,"robots_noindex":false,"robots_noarchive":false,"robots_nosnippet":false,"robots_nofollow":false,"robots_noimageindex":false,"robots_noodp":false,"robots_notranslate":false,"robots_max_snippet":null,"robots_max_videopreview":null,"robots_max_imagepreview":"large","priority":null,"frequency":null,"location":null,"local_seo":null,"limit_modified_date":false,"created":"2020-12-21 05:57:30","updated":"2026-07-27 05:51:25","ai":null,"breadcrumb_settings":null,"seo_analyzer_scan_date":null},"aioseo_breadcrumb":"<div class=\"aioseo-breadcrumbs\"><span class=\"aioseo-breadcrumb\">\n\t\t\t<a href=\"https:\/\/www.ostech.co.jp\/en\/\" title=\"Home\">Home<\/a>\n\t\t<\/span><span class=\"aioseo-breadcrumb-separator\">&raquo;<\/span><span class=\"aioseo-breadcrumb\">\n\t\t\t<a href=\"https:\/\/www.ostech.co.jp\/en\/products\/\" title=\"Services\">Services<\/a>\n\t\t<\/span><span class=\"aioseo-breadcrumb-separator\">&raquo;<\/span><span class=\"aioseo-breadcrumb\">\n\t\t\t<a href=\"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/\" title=\"Fine Ceramics\">Fine Ceramics<\/a>\n\t\t<\/span><span class=\"aioseo-breadcrumb-separator\">&raquo;<\/span><span class=\"aioseo-breadcrumb\">\n\t\t\tAIN Ceramics for Semiconductor Equipment\n\t\t<\/span><\/div>","aioseo_breadcrumb_json":[{"label":"Home","link":"https:\/\/www.ostech.co.jp\/en\/"},{"label":"Services","link":"https:\/\/www.ostech.co.jp\/en\/products\/"},{"label":"Fine Ceramics","link":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/"},{"label":"AIN Ceramics for Semiconductor Equipment","link":"https:\/\/www.ostech.co.jp\/en\/products\/fine-ceramics\/ain-ceramics-for-semiconductor-equipment\/"}],"_links":{"self":[{"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/pages\/1781","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/comments?post=1781"}],"version-history":[{"count":0,"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/pages\/1781\/revisions"}],"up":[{"embeddable":true,"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/pages\/1778"}],"wp:attachment":[{"href":"https:\/\/www.ostech.co.jp\/en\/wp-json\/wp\/v2\/media?parent=1781"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}